Dr. Christoph Noelscher
Senior Staff Expert at Carl Zeiss SMT AG
SPIE Involvement:
Publications (18)

SPIE Journal Paper | 1 January 2009
Christoph Noelscher, Marcel Heller, Matthias Markert, Dietmar Temmler, Franck Jauzion-Graverolle, Nicolo Morgana, Ulrich Scheler, Bee-Kim Hong, Ulrich Egger, Vadim Timoshkov, Mirko Vogt
JM3, Vol. 8, Issue 01, 011005, (January 2009) https://doi.org/10.1117/12.10.1117/1.3066296
KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

Proceedings Article | 2 May 2008 Paper
Christoph Noelscher, Franck Jauzion-Graverolle, Thomas Henkel
Proceedings Volume 6792, 67920Q (2008) https://doi.org/10.1117/12.798807
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photomasks, Lithography, Optical fiber cables, Colorimetry, Chromatic aberrations, Computer aided design, Calibration, Scanners

Proceedings Article | 1 April 2008 Paper
Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer
Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

Proceedings Article | 7 March 2008 Paper
Christoph Noelscher, Franck Jauzion-Graverolle, Marcel Heller, Matthias Markert, Bee-Kim Hong, Ulrich Egger, Dietmar Temmler
Proceedings Volume 6924, 69240Q (2008) https://doi.org/10.1117/12.772750
KEYWORDS: Etching, Amorphous silicon, Semiconducting wafers, Lithography, Double patterning technology, Critical dimension metrology, Optical lithography, 193nm lithography, Photomasks, Image processing

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301W (2007) https://doi.org/10.1117/12.746392
KEYWORDS: Finite element methods, Photomasks, Computer simulations, Critical dimension metrology, Near field, Chemical elements, Light scattering, Chromium, Optical lithography, Electromagnetism

Showing 5 of 18 publications
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