Dr. Christoph Noelscher
Senior Staff Expert at Carl Zeiss SMT AG
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Chromatic aberrations, Lithography, Calibration, Scanners, Colorimetry, Photomasks, Optical fiber cables, Computer aided design, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical lithography, Light scattering, Chromium, Computer simulations, Near field, Finite element methods, Photomasks, Critical dimension metrology, Chemical elements, Electromagnetism

Showing 5 of 18 publications
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