Dr. Christoph Spengler
at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | November 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 31, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanofabrication, Photomask technology

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