Dr. Christoph Zaczek
Senior Principal at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Data modeling, Deep ultraviolet, Reflectivity, Photoresist materials, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

Proceedings Article | 25 September 2008 Paper
Proc. SPIE. 7101, Advances in Optical Thin Films III
KEYWORDS: Thin films, Refractive index, Magnesium fluoride, Metals, Ions, Surface roughness, Deposition processes, Photometry, Fluorine, Absorption

Proceedings Article | 25 September 2008 Paper
Proc. SPIE. 7101, Advances in Optical Thin Films III
KEYWORDS: Lithography, Mirrors, Contamination, Ultraviolet radiation, Optical coatings, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, 193nm lithography

Proceedings Article | 3 March 2000 Paper
Proc. SPIE. 3902, Laser-Induced Damage in Optical Materials: 1999
KEYWORDS: Optical components, Deep ultraviolet, Reflection, Scattering, Optical coatings, Reflectivity, Laser damage threshold, Thin film coatings, Laser optics, Absorption

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