Dr. Christophe Couderc
Computational Lithography Engineer at MINATEC
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Thin films, Lithography, Statistical analysis, Polymethylmethacrylate, Polymers, Scanning electron microscopy, Microelectronics, Picosecond phenomena, Binary data, Molecular self-assembly

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Etching, Polymers, Silicon, Photomasks, Directed self assembly, Picosecond phenomena, 193nm lithography, Plasma

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Inspection, Process control, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Imaging systems, Inspection, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Defect inspection

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Metrology, Etching, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Phase shifts

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Defect detection, Image processing, Manufacturing, Inspection, Printing, Photomasks, Neodymium, Semiconducting wafers, Airborne remote sensing

Showing 5 of 24 publications
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