Dr. Christophe Couderc
Computational Lithography Engineer at MINATEC
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Molecular self-assembly, Picosecond phenomena, Statistical analysis, Polymers, Thin films, Binary data, Microelectronics, Polymethylmethacrylate, Scanning electron microscopy

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Polymers, 193nm lithography, Electron beam lithography, Silicon, Etching, Photomasks, Picosecond phenomena, Plasma, Directed self assembly

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Critical dimension metrology, Inspection, Semiconducting wafers, Scanning electron microscopy, Process control, Airborne remote sensing, Lithography, Defect inspection, Imaging systems

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Reticles, Phase shifts, Airborne remote sensing, Etching, Metrology

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Inspection, Neodymium, Photomasks, Reticles, Image processing, Defect detection, Semiconducting wafers, Airborne remote sensing, Manufacturing, Printing

Showing 5 of 24 publications
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