Mr. Christophe Defranoux
at SOPRALAB
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Thin films, Deep ultraviolet, X-rays, Reflectivity, Surface roughness, Reflectometry, Spectroscopic ellipsometry, Transmittance, X-ray characterization, Phase shifts

PROCEEDINGS ARTICLE | December 10, 2001
Proc. SPIE. 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
KEYWORDS: Semiconductors, Spectroscopy, Dielectrics, Silicon, Polarizers, Infrared spectroscopy, Spectroscopic ellipsometry, Infrared radiation, Fluorine, Absorption

PROCEEDINGS ARTICLE | April 20, 2001
Proc. SPIE. 4405, Process and Equipment Control in Microelectronic Manufacturing II
KEYWORDS: Oxides, Metrology, X-rays, Dielectrics, Interfaces, Silicon, Nitrogen, Reflectivity, Process control, Spectroscopic ellipsometry

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Thin films, Reflection, Spectroscopy, Ultraviolet radiation, X-rays, Dielectrics, Reflectivity, Photoresist materials, Spectroscopic ellipsometry, Transmittance

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Wafer-level optics, Mirrors, Antireflective coatings, Multilayers, Deep ultraviolet, Spectroscopy, Photoresist materials, Spectroscopic ellipsometry, Semiconducting wafers, Spectroscopes

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Refractive index, Calibration, Spectroscopy, Silicon, Photoresist materials, Refraction, Spectroscopic ellipsometry, Semiconducting wafers, Absorption

Showing 5 of 13 publications
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