Mr. Christophe Defranoux Profile

Mr. Christophe Defranoux

at SOPRALAB

SPIE Involvement:

Author

Publications (13)

PROCEEDINGS ARTICLE | December 27, 2002

Precise and accurate characterization of DUV and V-UV phase-shifting mask materials by combined V-UV spectroscopic ellipsometry and x-ray reflectometry

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Thin films, Deep ultraviolet, X-rays, Reflectivity, Surface roughness, Reflectometry, Spectroscopic ellipsometry, Transmittance, X-ray characterization, Phase shifts

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PROCEEDINGS ARTICLE | December 10, 2001

IR spectroscopic ellipsometry for industrial characterization of semiconductors

Proc. SPIE. 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II

KEYWORDS: Semiconductors, Spectroscopy, Dielectrics, Silicon, Polarizers, Infrared spectroscopy, Spectroscopic ellipsometry, Infrared radiation, Fluorine, Absorption

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PROCEEDINGS ARTICLE | April 20, 2001

Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry

Proc. SPIE. 4405, Process and Equipment Control in Microelectronic Manufacturing II

KEYWORDS: Oxides, Metrology, X-rays, Dielectrics, Interfaces, Silicon, Nitrogen, Reflectivity, Process control, Spectroscopic ellipsometry

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PROCEEDINGS ARTICLE | June 2, 2000

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV

KEYWORDS: Thin films, Reflection, Spectroscopy, Ultraviolet radiation, X-rays, Dielectrics, Reflectivity, Photoresist materials, Spectroscopic ellipsometry, Transmittance

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PROCEEDINGS ARTICLE | June 14, 1999

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII

KEYWORDS: Wafer-level optics, Mirrors, Antireflective coatings, Multilayers, Deep ultraviolet, Spectroscopy, Photoresist materials, Spectroscopic ellipsometry, Semiconducting wafers, Spectroscopes

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PROCEEDINGS ARTICLE | June 11, 1999

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI

KEYWORDS: Lithography, Refractive index, Calibration, Spectroscopy, Silicon, Photoresist materials, Refraction, Spectroscopic ellipsometry, Semiconducting wafers, Absorption

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PROCEEDINGS ARTICLE | April 28, 1999

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Proc. SPIE. 3741, Lithography for Semiconductor Manufacturing

KEYWORDS: Lithography, Refractive index, Calibration, Spectroscopy, Silicon, Photoresist materials, Time metrology, Spectroscopic ellipsometry, Semiconducting wafers, Absorption

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PROCEEDINGS ARTICLE | April 27, 1999

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm-wafer technology

Proc. SPIE. 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing

KEYWORDS: Wafer-level optics, Mirrors, Antireflective coatings, Multilayers, Deep ultraviolet, Spectroscopy, Photoresist materials, Spectroscopic ellipsometry, Semiconducting wafers, Spectroscopes

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PROCEEDINGS ARTICLE | July 7, 1997

Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry

Proc. SPIE. 3050, Metrology, Inspection, and Process Control for Microlithography XI

KEYWORDS: Antireflective coatings, Deep ultraviolet, Reflection, X-rays, Silicon, Reflectivity, Optical testing, Spectroscopic ellipsometry, UV optics, Absorption

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PROCEEDINGS ARTICLE | August 16, 1996

Spectroscopic ellipsometry and photometry applied to color filter characterization

Proc. SPIE. 2873, International Symposium on Polarization Analysis and Applications to Device Technology

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PROCEEDINGS ARTICLE | August 16, 1996

Fine characterization of ITO layers by spectroscopic ellipsometry

Proc. SPIE. 2873, International Symposium on Polarization Analysis and Applications to Device Technology

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PROCEEDINGS ARTICLE | August 16, 1996

Thickness and index measurements of 8-um liquid crystal gap between plates by spectroscopic ellipsometry

Proc. SPIE. 2873, International Symposium on Polarization Analysis and Applications to Device Technology

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PROCEEDINGS ARTICLE | June 7, 1996

Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Oxides, Antireflective coatings, Deep ultraviolet, Reflection, Ultraviolet radiation, X-rays, Silicon, Reflectivity, Spectroscopic ellipsometry, Absorption

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Showing 5 of 13 publications

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