Dr. Christophe Peroz Profile

Dr. Christophe Peroz

Distinguished Scientist at Sony Corp

SPIE Involvement:

Conference Chair | Editor | Author | Special Event Speaker

Proceedings Article | 1 September 2015 Paper

Binary pseudorandom test standard to determine the modulation transfer function of optical microscopes

Ian Lacey, Erik Anderson, Nikolay Artemiev, Sergey Babin, Stefano Cabrini, Guiseppe Calafiore, Elaine Chan, Wayne McKinney, Christophe Peroz, Peter Takacs, Valeriy Yashchuk

Proc. SPIE. 9576, Applied Advanced Optical Metrology Solutions

KEYWORDS: Modulation transfer functions, Binary data, Calibration, Spatial frequencies, Standards development, Optical microscopes, Silicon, Error analysis, Sensors, Optical fabrication

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SPIE Journal Paper | 7 August 2015

Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices

Alexander Koshelev, Alexander Goltsov, Vladimir Yankov, Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Martin Messerschmidt, Arne Schleunitz, Carlos Piña-Hernandez, Fabrizio Pirri, Stefano Cabrini, Christophe Peroz

JM3 Vol. 14 Issue 03

KEYWORDS: Nanoimprint lithography, Integrated optics, Semiconducting wafers, Holograms, Etching, Electron beam lithography, Information operations, Waveguides, Oxygen, Spectroscopes

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SPIE Journal Paper | 5 September 2014

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre Olynick, Christophe Peroz, Stefano Cabrini

JM3 Vol. 13 Issue 03

KEYWORDS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy

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Proceedings Article | 10 January 2013 Paper

Formation of nanoscale structures by inductively coupled plasma etching

Colin Welch, Deirdre Olynick, Zuwei Liu, Anders Holmberg, Christophe Peroz, Alex P. Robinson, M. David Henry, Axel Scherer, Thomas Mollenhauer, Vince Genova, Doris K. Ng

Proc. SPIE. 8700, International Conference Micro- and Nano-Electronics 2012

KEYWORDS: Etching, Silicon, Photomasks, Ions, Plasma, Cryogenics, Polymers, Nanoimprint lithography, Silica, Chromium

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Proceedings Article | 3 April 2012 Paper

Challenges of SEM metrology at sub-10nm linewidth

Sergey Babin, Sergey Borisov, Christophe Peroz, Peter Yushmanov

Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI

KEYWORDS: Scanning electron microscopy, Metrology, Monte Carlo methods, Image analysis, Image quality, Cadmium, Sensors, Line width roughness, Critical dimension metrology, Line edge roughness

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Proceedings Article | 2 April 2010 Paper

Fabrication of a new BEAMETR chip for automatic electron beam size measurement

S. Babin, K. Bay, S. Cabrini, S. Dhuey, B. Harteneck, M. Machin, C. Peroz

Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV

KEYWORDS: Electron beams, Optical testing, Scanning electron microscopy, Metrology, Electron beam lithography, Beam shaping, Image analysis, Polymethylmethacrylate, Metals, Fabrication

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Proceedings Article | 1 August 2007 Paper

Electronic and thermal nonlinear refractive indices of SOI and nano-patterned SOI measured by Z-scan method

A. Petris, F. Pettazzi, E. Fazio, C. Peroz, Y. Chen, V. Vlad, M. Bertolotti

Proc. SPIE. 6785, ROMOPTO 2006: Eighth Conference on Optics

KEYWORDS: Silicon, Refractive index, Reflection, Nonlinear response, Mode locking, Semiconductor lasers, Silicon photonics, Femtosecond phenomena, Optical components, Nonlinear optics

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