Dr. Christopher M. Aquino
Applications Engineering Manager and Sales Rep at KLA Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Detection and tracking algorithms, Data modeling, Sensors, Calibration, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, Systems modeling

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Quartz, Manufacturing, Inspection, Scanning electron microscopy, Bridges, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Air contamination, Crystals, Inspection, Image quality, Wafer inspection, Photomasks, Semiconducting wafers

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Inspection, Printing, Solids, Photomasks, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 11 publications
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