Dr. Christopher P. Ausschnitt
Sr. Member of Technical Staff at IBM Corp
SPIE Involvement:
Fellow status | Conference Co-Chair | Conference Program Committee | Conference Chair | Author
Publications (33)

SPIE Journal Paper | October 25, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Scanners, Control systems, Quality measurement, Semiconducting wafers, Binary data, Overlay metrology

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical imaging, Lithography, Optical lithography, Error analysis, Photomasks, Double patterning technology, Semiconducting wafers, Tolerancing, Overlay metrology, Tin

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Data modeling, Scanners, Distortion, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Control systems, Scatterometry, Finite element methods, Deconvolution, Semiconducting wafers, Overlay metrology

Showing 5 of 33 publications
Conference Committee Involvement (4)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Data Analysis and Modeling for Process Control II
3 March 2005 | San Jose, California, United States
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Advanced Process Control and Automation
27 February 2003 | Santa Clara, CA, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top