Dr. Chris Bencher
at Applied Materials Inc
SPIE Involvement:
Author | Editor
Publications (36)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 129570X (2024) https://doi.org/10.1117/12.3010203
KEYWORDS: Lithography, Packaging, Polyimides, Materials properties, Electrical properties, Dielectrics, Image processing, Film thickness, Chemical mechanical planarization, Advanced packaging

SPIE Journal Paper | 4 October 2016 Open Access
JM3, Vol. 15, Issue 03, 031601, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031601
KEYWORDS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography

SPIE Journal Paper | 3 October 2014 Open Access
JM3, Vol. 13, Issue 03, 031301, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031301
KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

Proceedings Article | 2 April 2014 Paper
Nadine Alexis, Chris Bencher, Yongmei Chen, Huixiong Dai, Kfir Dotan, Dale Huang, Alison Nalven, Chris Ngai, Gaetano Santoro, Bharath Vijayaraghavan, Peng Xie, Jun Xue
Proceedings Volume 9050, 905030 (2014) https://doi.org/10.1117/12.2048356
KEYWORDS: Inspection, Polarization, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Photomasks, Signal to noise ratio, Wafer inspection, Metrology

Proceedings Article | 27 March 2014 Paper
Linus Jang, Young Joon Moon, Ryoung-Han Kim, Christopher Bencher, Huixiong Dai, Peng Xie, Daniel Diehl, Yong Cao, Wilson Zeng, Christopher Ngai
Proceedings Volume 9051, 90510Y (2014) https://doi.org/10.1117/12.2046107
KEYWORDS: Photoresist materials, Optical lithography, Etching, Lithography, Semiconducting wafers, Silicon, System on a chip, Double patterning technology, Manufacturing, Reflectivity

Showing 5 of 36 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 4 May 2017

SPIE Conference Volume | 5 July 2016

SPIE Conference Volume | 21 April 2015

SPIE Conference Volume | 30 April 2014

Conference Committee Involvement (6)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Alternative Lithographic Technologies VI
24 February 2014 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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