Dr. Chris Bencher
at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author
Publications (39)

SPIE Conference Volume | May 4, 2017

SPIE Journal Paper | October 4, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography

SPIE Conference Volume | July 5, 2016

SPIE Conference Volume | April 21, 2015

SPIE Journal Paper | October 3, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

SPIE Conference Volume | April 30, 2014

Showing 5 of 39 publications
Conference Committee Involvement (6)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Alternative Lithographic Technologies VI
24 February 2014 | San Jose, California, United States
Showing 5 of 6 published special sections
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