Dr. Christopher M. Bottoms
at IBM Research - Albany
SPIE Involvement:
Publications (6)

Proceedings Article | 16 April 2024 Presentation + Paper
Katherine Sieg, Christopher Bottoms, Christopher Waskiewicz, Alejandro Matos Mejia, Junwon Han, Shahid Butt, Daniel Schmidt, Stefan Schoeche, Alexander Hamer, Alex Hubbard
Proceedings Volume 12955, 129551P (2024) https://doi.org/10.1117/12.3012149
KEYWORDS: Semiconducting wafers, Interferometry, Wafer bonding, Metrology

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC129560E (2024) https://doi.org/10.1117/12.3012541
KEYWORDS: Optical lithography, Lithography, Coating thickness, Semiconducting wafers, Plating, Photoresist processing, Dielectrics, Coating

SPIE Journal Paper | 30 August 2023
Christopher M. Bottoms, Grant E. Bauman, Gila E. Stein, Manolis Doxastakis
JM3, Vol. 22, Issue 03, 034601, (August 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.034601
KEYWORDS: Polymers, Sodium, Diffusion, Chemistry, Polymer thin films, Film thickness, Photoacid generators, Data modeling, Chemically amplified resists, Chemical species

Proceedings Article | 1 May 2023 Presentation + Paper
Christopher Bottoms, Manolis Doxastakis, Gila Stein
Proceedings Volume 12498, 124980M (2023) https://doi.org/10.1117/12.2656952
KEYWORDS: Polymers, Simulations, Diffusion, Polymer thin films, Film thickness, Chemistry, Photoacid generators, Chemical species, Autocorrelation, Lithography, Chemically amplified resists, Resist chemistry, Spectroscopic ellipsometry, Applied physics

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 1205506 (2022) https://doi.org/10.1117/12.2613355
KEYWORDS: Modeling and simulation, Monte Carlo methods, Resist chemistry, Diffusion, Polymers, Chemically amplified resists, Systems modeling, FT-IR spectroscopy, Spectroscopic ellipsometry, Polymer thin films, Optical lithography, Ions

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