Christopher P. Braun
Member Technical Staff at Broadcom Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Databases, Manufacturing, Control systems, Photomasks, Integrated circuits, Semiconducting wafers, Integrated circuit design, Photomask technology, Prototyping

Proceedings Article | 27 December 1996
Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Glasses, Manufacturing, Image registration, Time metrology, Photomasks, Standards development

Proceedings Article | 8 December 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beams, Reticles, Opacity, Polymers, Coating, Manufacturing, Inspection, Photomasks, Photoresist processing, Tolerancing

Proceedings Article | 1 January 1992
Proc. SPIE. 1604, 11th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Opacity, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Tolerancing, Indium oxide, Edge roughness

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