Dr. Christopher Constantine
Senior Principle Scientist at Oerlikon USA Inc
SPIE Involvement:
Publications (23)

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490A (2006) https://doi.org/10.1117/12.686390
KEYWORDS: Etching, Photomasks, Chromium, Binary data, Critical dimension metrology, Plasma, Control systems, Ions, Lithography

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62831U (2006) https://doi.org/10.1117/12.681757
KEYWORDS: Etching, Chromium, Genetic algorithms, Signal processing, Plasma, Photomasks, Signal to noise ratio, Plasma etching, Sensors, Reflectivity

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617095
KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Chromium, Chemistry, Dry etching, Plasma, Scanning electron microscopy, Photoresist processing

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.571468
KEYWORDS: Etching, Photomasks, Quartz, Scanning electron microscopy, Reactive ion etching, Phase shifts, Dry etching, Lithography, Manufacturing, Surface roughness

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557706
KEYWORDS: Etching, Photomasks, Reactive ion etching, Chromium, Critical dimension metrology, Dry etching, Optical proximity correction, Binary data, Photoresist materials, Lithography

Showing 5 of 23 publications
Conference Committee Involvement (4)
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top