Christopher M. Cork
Senior Staff Engineer at Synopsys SARL
SPIE Involvement:
Publications (28)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Metals, Legal, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Network architectures

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Image resolution, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Neodymium, Surface conduction electron emitter displays

Proceedings Article | 7 March 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Dielectrics, Photomasks, Cadmium sulfide, Double patterning technology, Immersion lithography

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Diffraction, Calibration, Image processing, Manufacturing, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image segmentation, Scanners, Manufacturing, Far-field diffraction, Photomasks, Optical proximity correction, Neodymium

Showing 5 of 28 publications
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