Christopher J. Goetz
Development Analyst at Photronics Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 8 December 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Photomasks, Manufacturing, Opacity, Photoresist processing, Image processing, Thin films, Electron beams, Semiconducting wafers, Reticles, Lithography

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