Christopher A. Lee
Product Line Manager at Corning Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | May 28, 2018
Proc. SPIE. 10695, Optical Instrument Science, Technology, and Applications
KEYWORDS: Optical components, Reticles, Polishing, Optomechanical components, Metrology, Scanners, Error analysis, Manufacturing, Interferometry, Photomasks, Tolerancing, Precision lens assemblies

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Overlay metrology

PROCEEDINGS ARTICLE | November 17, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Reticles, Scanners, Error analysis, Photomasks, Extreme ultraviolet, Semiconducting wafers, Tolerancing, Data corrections, Overlay metrology

PROCEEDINGS ARTICLE | August 3, 2010
Proc. SPIE. 7790, Interferometry XV: Techniques and Analysis
KEYWORDS: Tunable lasers, Metrology, Modulation, Interferometers, Interferometry, Semiconductor lasers, Modes of laser operation, Assembly tolerances, Assembly equipment, Surface finishing

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Fluctuations and noise, Error analysis, Pellicles, Printing, Finite element methods, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers

Showing 5 of 9 publications
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