Christopher A. Lee
Product Line Manager at Corning Inc
SPIE Involvement:
Publications (11)

Proceedings Article | 10 October 2019 Presentation + Paper
David Aronstein, Christopher Avery, Katherine Ballman, Christopher Lee, John Zimmerman
Proceedings Volume 11148, 111480V (2019)
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Scanners, Polishing, Computer simulations, Surface finishing

Proceedings Article | 27 June 2019 Paper
David Aronstein, Katherine Ballman, Christopher Lee, John Zimmerman
Proceedings Volume 11178, 111780H (2019)
KEYWORDS: Photomasks, Extreme ultraviolet, Distortion, Photovoltaics, Metrology, Spatial frequencies, Polishing, Extreme ultraviolet lithography, Optical lithography, Scanners

Proceedings Article | 28 May 2018 Paper
Robert Grejda, Katherine Ballman, Chris Lee
Proceedings Volume 10695, 106950G (2018)
KEYWORDS: Tolerancing, Reticles, Optical components, Photomasks, Manufacturing, Scanners, Metrology, Error analysis, Polishing, Interferometry, Precision lens assemblies, Optomechanical components

Proceedings Article | 16 October 2017 Presentation
Christina Turley, Jed Rankin, Xuemei Chen, Katherine Ballman, Christopher Lee, Tom Dunn
Proceedings Volume 10450, 104500A (2017)
KEYWORDS: Reticles, Extreme ultraviolet, Scanners, Overlay metrology, Distortion, Manufacturing, Extreme ultraviolet lithography, Photomasks, High volume manufacturing, Lithography

Proceedings Article | 17 November 2016 Paper
Katherine Ballman, Christopher Lee, John Zimmerman, Thomas Dunn, Alexander Bean
Proceedings Volume 9985, 99850N (2016)
KEYWORDS: Reticles, Extreme ultraviolet, Photomasks, Overlay metrology, Error analysis, Semiconductors, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Metrology

Showing 5 of 11 publications
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