Christopher K. Magg
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Image processing, Manufacturing, Inspection, Design for manufacturing, Photomasks, Semiconductor manufacturing, Optical proximity correction, SRAF, Semiconducting wafers, Yield improvement

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Contamination, Particles, Silicon, Manufacturing, Inspection, Photomasks, Aluminum, Chemical analysis, Tantalum, Semiconducting wafers

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Packaging, Lithography, Electron beam lithography, Etching, Polymers, Resistance, Scanning electron microscopy, Photomasks, Mask making, Plasma

Proceedings Article | 5 September 2001 Paper
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Lithography, Etching, Dry etching, Silicon, Resistance, Image resolution, Chromium, Photomasks, Mask making, Photoresist processing

Proceedings Article | 24 August 2001 Paper
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Thin films, Electron beam lithography, Electron beams, Deep ultraviolet, Modulation, Silicon, Scanning electron microscopy, Photomicroscopy, Semiconducting wafers, Chemically amplified resists

Showing 5 of 16 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top