Dr. Christopher K. Ober
at Cornell Univ
SPIE Involvement:
Profile Summary

Christopher Ober is the Francis Bard Professor of Materials Engineering at Cornell University. He is currently the director of the Cornell NanoScale Facility, CNF. He has pioneered new materials for photolithography and studies the biology-materials interface. Ober received his B.Sc. in Honours Chemistry (Co-op) from the University of Waterloo, Ontario, Canada in 1978 and his M.S. and Ph.D. in Polymer Science & Engineering from the University of Massachusetts (Amherst) in 1982. From 1982 until 1986 he was a senior member of the research staff at the Xerox Research Centre of Canada where he worked on marking materials. Ober joined Cornell University in the Department of Materials Science and Engineering in 1986. He recently served as Interim Dean of the College of Engineering. He is a fellow of the ACS (2009), APS (2014), and AAAS (2014). He is a SPIE Senior member (2018). He received the ACS Award in Applied Polymer Science in 2006, the Gutenberg Research Award in 2009, the Society of Polymer Science Japan (SPSJ) International Prize in 2013 and the Japan Photopolymer Science and Technology Outstanding Achievement Award in 2015. Ober was President of the IUPAC Polymer Division (2008 – 2011), Chair of the Interdivisional Subcommittee on Materials Chemistry (2011 – 2017) and is an elected member of the IUPAC Executive Committee (2014 – 2021).
Publications (101)

Proceedings Article | 10 April 2024 Presentation
Chenyun Yuan, Erina Yoshida, Cameron Adams, Rachel Segalman, Christopher Ober
Proceedings Volume 12957, 129570S (2024) https://doi.org/10.1117/12.3011864
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Metals, Stochastic processes, Chemical species, Switches, Solubility, Lithography, Light absorption, Transistors

Proceedings Article | 10 April 2024 Poster
Cameron Adams, Chenyun Yuan, Qi Zhang, Oleg Kostko, Christopher Ober, Rachel Segalman
Proceedings Volume 12957, 1295724 (2024) https://doi.org/10.1117/12.3012454
KEYWORDS: Polymers, Metals, Halogens, Extreme ultraviolet, Chemically amplified resists, Stochastic processes, Photoresist materials, Optical lithography, Line edge roughness, Extreme ultraviolet lithography

Proceedings Article | 22 November 2023 Presentation
Cameron Adams, Xiangxi Meng, Florian Kaefer, Chenyun Yuan, Christopher Ober, Rachel Segalman
Proceedings Volume PC12750, PC127500J (2023) https://doi.org/10.1117/12.2688477
KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Chemically amplified resists, Extreme ultraviolet lithography, Polymers, Optical lithography, Chemical composition, Switches, Stochastic processes, Solubility

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 1249817 (2023) https://doi.org/10.1117/12.2658413
KEYWORDS: Lithography, Extreme ultraviolet lithography, Solubility, Polymers, Solids, Photoacid generators, Extreme ultraviolet, Electron beam lithography, Chemical composition, Switching

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980F (2023) https://doi.org/10.1117/12.2658582
KEYWORDS: Photoresist materials, Polymers, Stochastic processes, Solubility, Chemical composition, Lithography, Polymerization, Nitrogen, Extreme ultraviolet lithography

Showing 5 of 101 publications
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