Prof. Christopher K. Ober
Francis Bard Prof. of Materials at Cornell Univ
SPIE Involvement:
Author
Publications (88)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Oxides, Lithography, Nanoparticles, Etching, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Hafnium, Zirconium

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: FT-IR spectroscopy, Optical lithography, Chemical species, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Hafnium, Zirconium, Photoresist developing

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Oxides, Lithography, Optical lithography, Nanoparticles, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Zirconium

SPIE Journal Paper | September 27, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photoresist materials, Zirconium, Optical lithography, FT-IR spectroscopy, Metals, Extreme ultraviolet lithography, Photoresist developing, Oxides, Deep ultraviolet, Electron beam lithography

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Nanoparticles, Metals, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Zirconium, Photoresist developing

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Optical lithography, Deep ultraviolet, Nanoparticles, Image processing, Molecules, Scanning electron microscopy, Photoresist materials, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

Showing 5 of 88 publications
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