Prof. Christopher K. Ober
at Cornell Univ
SPIE Involvement:
Author
Profile Summary

Christopher Ober is the Francis Bard Professor of Materials Engineering at Cornell University. He is currently the director of the Cornell NanoScale Facility, CNF. He has pioneered new materials for photolithography and studies the biology-materials interface. Ober received his B.Sc. in Honours Chemistry (Co-op) from the University of Waterloo, Ontario, Canada in 1978 and his M.S. and Ph.D. in Polymer Science & Engineering from the University of Massachusetts (Amherst) in 1982. From 1982 until 1986 he was a senior member of the research staff at the Xerox Research Centre of Canada where he worked on marking materials. Ober joined Cornell University in the Department of Materials Science and Engineering in 1986. He recently served as Interim Dean of the College of Engineering. He is a fellow of the ACS (2009), APS (2014), and AAAS (2014). He is a SPIE Senior member (2018). He received the ACS Award in Applied Polymer Science in 2006, the Gutenberg Research Award in 2009, the Society of Polymer Science Japan (SPSJ) International Prize in 2013 and the Japan Photopolymer Science and Technology Outstanding Achievement Award in 2015. Ober was President of the IUPAC Polymer Division (2008 – 2011), Chair of the Interdivisional Subcommittee on Materials Chemistry (2011 – 2017) and is an elected member of the IUPAC Executive Committee (2014 – 2021).
Publications (92)

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Lithography, Zinc, Optical lithography, Metals, Polymers

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Metals, Extreme ultraviolet lithography, Photoresist materials, Deep ultraviolet, Extreme ultraviolet, Lithography, Nanoparticles, Oxides

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Metals, Zirconium, Nanoparticles, Oxides, Extreme ultraviolet lithography, Zinc, Photoresist materials, Etching, Extreme ultraviolet, Lithography

SPIE Journal Paper | 8 December 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Oxides, Optical lithography, Lithography, Hafnium, Etching, Metals, Zirconium

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Nanoparticles, Photoresist materials, Oxides, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Metals, Hafnium, Zirconium

Showing 5 of 92 publications
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