Dr. Christopher J. Progler
Chief Technology Officer at Photronics Inc
SPIE Involvement:
Awards Committee | Board of Directors | Nominating Committee | Strategic Planning Committee | Symposia Committee | Fellow status | Symposium Committee | Conference Program Committee | Symposium Chair | Conference Chair | Author | Editor
Publications (65)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

SPIE Journal Paper | June 25, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Process modeling, Instrument modeling, Reflectivity, Defect inspection, Inspection, Mask making, Printing

SPIE Journal Paper | July 1, 2011
JM3 Vol. 10 Issue 03
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Lithographic illumination, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Phase shifts

Showing 5 of 65 publications
Conference Committee Involvement (21)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
Showing 5 of 21 published special sections
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