Dr. Christopher J. Raymond
Director Technology Development at Onto Innovation
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (28)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Light emitting diodes, Luminescence, Photons, Manufacturing, Physics, Process control, Spatial resolution, Metalorganic chemical vapor deposition, Semiconducting wafers

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical properties, Etching, Metals, Dielectrics, Atomic force microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Back end of line

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Diffraction, Nano opto mechanical systems, Data modeling, Photoresist materials, Scatterometry, Photomasks, Critical dimension metrology, Scatter measurement, Diffraction gratings

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Metrology, Polarization, Etching, Light scattering, Scatterometry, Measurement devices, Analytical research, Critical dimension metrology

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Polarization, Silicon, Clouds, Atomic force microscopy, Scatterometry, Domes, Critical dimension metrology, Scatter measurement

Showing 5 of 28 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (20)
Metrology, Inspection, and Process Control XXXVI
27 February 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Showing 5 of 20 Conference Committees
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