Chris F. Robinson
at IBM Corp
SPIE Involvement:
Author
Publications (20)

SPIE Journal Paper | September 5, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 4, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Sensors, Calibration, Scanners, Inspection, Gas lasers, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Scanners, Particles, Reflectivity, Surface roughness, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Carbon, Lithography, Optical lithography, Inspection, Signal processing, Wafer inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 20 publications
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