Chris F. Robinson
at IBM Corp
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Carbon, Contamination, Sensors, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Optical lithography, Modulation, Etching, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Nickel, Photomasks, Extreme ultraviolet, Palladium, Extreme ultraviolet lithography, Phase shifts, Defect inspection

SPIE Journal Paper | 5 September 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

Proceedings Article | 4 April 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Sensors, Calibration, Scanners, Inspection, Gas lasers, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tin

Showing 5 of 23 publications
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