Dr. Christopher L. Soles
Group Leader, Electronics Materials Polymers Div at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Magnesium, Polymers, Glasses, Molecules, Hydrogen, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Data modeling, Scattering, Sensors, X-rays, Dielectrics, Silicon, Laser scattering, Scanning electron microscopy, Transistors, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Ellipsometry, Data modeling, Polymers, Annealing, In situ metrology, Atomic force microscopy, Scatterometry, Solids, Nanoimprint lithography, Statistical modeling

PROCEEDINGS ARTICLE | March 28, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Skin, X-rays, Dielectrics, Silicon, Reflectivity, Picosecond phenomena, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Thin films, Metrology, Data modeling, Scattering, Polymers, X-rays, X-ray sources, Silicon, Reflectivity, Picosecond phenomena

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Scattering, Sensors, X-rays, Laser scattering, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Showing 5 of 24 publications
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