Dr. Chris A. Spence
VP Advanced Technology Development at ASML
SPIE Involvement:
Author
Publications (55)

Proceedings Article | 10 April 2024 Presentation + Paper
Jyun-Ming Chen, Cyrus Tabery, Christoph Hennerkes, Chris Spence, Benjamin Kam, Nader Shamma, Mohand Brouri, Maxence Delorme, David Rio
Proceedings Volume 12953, 129530C (2024) https://doi.org/10.1117/12.3010402
KEYWORDS: Photoresist materials, Optical proximity correction, Calibration, Semiconducting wafers, Shrinkage, Printing, Scanning electron microscopy, Photoresist developing, Metals, Critical dimension metrology

SPIE Journal Paper | 30 January 2024
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
JM3, Vol. 23, Issue 01, 011204, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011204
KEYWORDS: Microchannel plates, Optical proximity correction, Lithography, Extreme ultraviolet, Deep ultraviolet, Solids, SRAF, Metals, Photovoltaics, Data storage

Proceedings Article | 22 November 2023 Presentation
Cyrus Tabery, Miao Wang, Victor Blanco Carballo, Eren Canga, Aiqin Jiang, Chris Spence, Tom Wallow
Proceedings Volume PC12750, PC127500B (2023) https://doi.org/10.1117/12.2688141
KEYWORDS: Electron beam lithography, Metrology, Design and modelling, Scanning laser ophthalmoscopy, Scanning electron microscopy, Line width roughness, Image enhancement, Failure analysis, Extreme ultraviolet, Etching

Proceedings Article | 22 November 2023 Presentation
Thomas Wallow, Aiqin Jiang, Chris Spence, Ton Kiers, Tim Houben
Proceedings Volume PC12750, PC127500C (2023) https://doi.org/10.1117/12.2687837
KEYWORDS: Scanning electron microscopy, Defect detection, Extreme ultraviolet, Machine learning, Inspection

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500E (2023) https://doi.org/10.1117/12.2687699
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet, Data modeling, Calibration, Metrology, Finite element methods, Critical dimension metrology, Contour modeling, Computer simulations

Showing 5 of 55 publications
Conference Committee Involvement (3)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top