Dr. Chris A. Spence
VP Advanced Technology Development at ASML Silicon Valley
SPIE Involvement:
Author
Publications (46)

Proceedings Article | 13 October 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Extreme ultraviolet, Optical lithography, Plasma treatment, Stochastic processes, Extreme ultraviolet lithography, Photomasks, System on a chip, Lithography, Silica, Manufacturing

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

Proceedings Article | 28 April 2017 Presentation
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Optical proximity correction, Data modeling, Optical lithography, Signal to noise ratio, OLE for process control, Instrument modeling, Image analysis, Calibration, Metals

Showing 5 of 46 publications
Conference Committee Involvement (3)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
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