Dr. Christos F. Karanikas
at
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Author
Publications (3)

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Logic, Optical lithography, Diffractive optical elements, Etching, Image processing, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Semiconductors, Metals, Interfaces, Ions, Silicon, Photoresist materials, Scanning laser ophthalmoscopy, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Data modeling, Modulation, Polymers, Image processing, Diffusion, Manufacturing, Critical dimension metrology, Photoresist processing

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