Dr. Chuen-Huei Yang
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Databases, Microelectronics, System identification, Design for manufacturing, Photomasks, Lutetium, Semiconducting wafers, Rule based systems, Design for manufacturability

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Databases

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Radon, Visualization, Databases, Etching, Photomasks, Acquisition tracking and pointing, Data conversion, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Etching, Silicon, Inspection, Distortion, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Communication engineering

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Visualization, Databases, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Electronic design automation

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Calibration, Image processing, Manufacturing, Inspection, Reflectivity, Photomasks, Semiconducting wafers

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top