Dr. Chul-Hong Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photomasks, Extreme ultraviolet, Double patterning technology, Source mask optimization, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Optical lithography, Error analysis, Resistance, Monte Carlo methods, Capacitance, Photomasks, Transistors, Critical dimension metrology, Overlay metrology

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Reticles, Photomasks, Extreme ultraviolet, Dysprosium, Critical dimension metrology, Semiconducting wafers, Tolerancing, Yield improvement, Algorithms

Proceedings Article | 4 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Transistors, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Analog electronics, Algorithm development

Proceedings Article | 4 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Etching, Metals, Manufacturing, Photomasks, Double patterning technology, Semiconducting wafers

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Metals, Image processing, Manufacturing, Photomasks, Optical proximity correction, Model-based design, Instrument modeling

Showing 5 of 29 publications
Conference Committee Involvement (10)
Design-Process-Technology Co-optimization for Manufacturability XIV
23 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Showing 5 of 10 published special sections
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