CONFERENCE PROCEEDINGS
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Chul Kyu Yang
at S&S TECH
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Author
Publications (5)
Proceedings Article | 21 November 2023 Poster + Paper
A study on the imaging characteristics of phase shift mask for EUV technology with novel material
Minkyu P., Mikyung W., Gyeongwon S., Yongdae K., Chulkyu Y., Jonghwa L., Cheol S.
Proceedings Volume 12751, 127511B (2023) https://doi.org/10.1117/12.2687346
KEYWORDS: Extreme ultraviolet, Phase shifts, Resolution enhancement technologies, Optical properties, Optical lithography, Materials properties, Manufacturing, Lithography, Extreme ultraviolet lithography, Etching
Proceedings Article | 8 October 2014 Paper
Development and characterization of advanced phase-shift mask blanks for 14nm node and beyond
Chang-Jun Kim, Kyu-Jin Jang, Min-Ki Choi, Chul-Kyu Yang, Jae-Chul Lee, Jong-Keun Lee, Byung-Sun Kang, Jong-Hwa Lee, Cheol Shin, Kee-Soo Nam
Proceedings Volume 9235, 92351L (2014) https://doi.org/10.1117/12.2066112
KEYWORDS: Photomasks, Etching, Phase shifts, Chromium, Semiconducting wafers, Molybdenum, Transmittance, Manufacturing, Sputter deposition, Scanning probe microscopy
Proceedings Article | 1 November 2007 Paper
A study of haze generation as thin film materials
Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam, Jong-Min Kim, Manish Patil, Ik-Bum Hur, Sang-Soo Choi
Proceedings Volume 6730, 67304K (2007) https://doi.org/10.1117/12.746684
KEYWORDS: Air contamination, Ions, Nitrogen, Metals, Thin films, Photomasks, Chemical analysis, Inspection, Scanning probe microscopy, Quartz
Proceedings Article | 30 October 2007 Paper
Investigation of airborne molecular contamination adsorption rate as storage materials in mask
Chul-Kyu Yang, Han-Sun Cha, Sin-Ju Yang, Ju-Hyun Kang, Jin-Ho Ahn, Kee-Soo Nam
Proceedings Volume 6730, 67301D (2007) https://doi.org/10.1117/12.746675
KEYWORDS: Thin films, Ions, Adsorption, Photomasks, Air contamination, Quartz, Silicon, Semiconducting wafers, Phase shifts, Contamination
Proceedings Article | 30 October 2007 Paper
The behavior of substrate dependency as surface treatment in the positive chemically amplified resist
Sin-Ju Yang, Han-Sun Cha, Ju-Hyun Kang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam
Proceedings Volume 6730, 67300J (2007) https://doi.org/10.1117/12.746652
KEYWORDS: Chromium, Etching, Autoregressive models, Photomasks, Quartz, Dry etching, Oxides, Nitrogen, Interfaces, Ultraviolet radiation
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