Chun-Chieh Chen
Senior Photo Solution Engineer at KLA-Tencor Taiwan
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Metrology, Scattering, Signal attenuation, Air contamination, Metals, Luminescence, Inspection, Process control, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Defect detection, Air contamination, Inspection, Software development, Wafer inspection, Photomasks, Dysprosium, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Modulation, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Semiconducting wafers, Resolution enhancement technologies, Data analysis, Defect inspection

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Copper, Inspection, Wafer inspection, Photomasks, Semiconductor manufacturing, Optical proximity correction, Semiconducting wafers, Library classification systems, Back end of line, Defect inspection

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