Chun-Hung Ko
Engineer at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Target detection, Detection and tracking algorithms, Reflectivity, Scatterometry, Neural networks, Critical dimension metrology, Scatter measurement, Model-based design, Evolutionary algorithms, Instrument modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Refractive index, Metrology, Optical properties, Reflectivity, Scatterometry, Process control, Measurement devices, Semiconductor manufacturing, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | September 15, 2005
Proc. SPIE. 5908, Optical Information Systems III
KEYWORDS: Diffraction, Metrology, Scattering, Light scattering, Optical testing, Scatterometry, Critical dimension metrology, Overlay metrology, Inverse optics, Diffraction gratings

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, Scattering, Light scattering, Laser scattering, Interference (communication), Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Microscopes, Metrology, Spectroscopy, Silicon, Reflectivity, Scatterometry, Reflectance spectroscopy, Overlay metrology, Light, Diffraction gratings

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