Dr. Chun-Hung Liu
at Taiwan Semiconductor Manufacturing Co. Ltd.
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Monte Carlo methods, Photomasks, Beam shaping, Critical dimension metrology, Model-based design, Process modeling, Vestigial sideband modulation

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Inspection, Ion beams, Bridges, Helium, Critical dimension metrology, Photoresist processing

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Scattering, Calibration, Light scattering, 3D modeling, Scatterometry, Process control, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Electrons, Directed self assembly, Transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Tolerancing

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Scatterometry, Signal processing, Process control, Photomasks, Optical proximity correction, Systems modeling, Process modeling

SPIE Journal Paper | 22 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

Showing 5 of 10 publications
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