Dr. Chun-Kuang Chen
Director at ASML Taiwan Ltd
SPIE Involvement:
Area of Expertise:
Photo-Lithography , EUVL
Publications (22)

SPIE Journal Paper | 14 June 2023 Open Access
Tsai-Sheng Gau, Po-Hsiung Chen, Burn J. Lin, Fu-Hsiang Ko, Chun-Kung Chen, Anthony Yen
JM3, Vol. 22, Issue 02, 023201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.023201
KEYWORDS: Fourier transforms, Computer simulations, Light sources and illumination, Diffraction, Ultrafast phenomena, Lithography, Matrices, Optical proximity correction, Partial coherence, Optical lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249509 (2023) https://doi.org/10.1117/12.2658871
KEYWORDS: Metals, Extreme ultraviolet, Source mask optimization, Nanoimprint lithography, Personal protective equipment, Critical dimension metrology, Logic, Optical lithography, Surface plasmons, Lithography

Proceedings Article | 1 December 2022 Paper
Proceedings Volume 12293, 122930C (2022) https://doi.org/10.1117/12.2642302
KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Data modeling, Line width roughness, Logic, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12052, 120520G (2022) https://doi.org/10.1117/12.2614225
KEYWORDS: Source mask optimization, Metals, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Logic, Optical lithography, Molybdenum, SRAF, Extreme ultraviolet lithography

Proceedings Article | 20 March 2018 Presentation + Paper
Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin
Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387
KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

Showing 5 of 22 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top