Dr. Chun-Kuang Chen
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Manufacturing, Distortion, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Polarization, Polarizers, Image quality, Transmittance, Photomasks, Immersion lithography, Dielectric polarization, Diffraction gratings

Proceedings Article | 17 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Photons, Extreme ultraviolet, Quantum physics, Extreme ultraviolet lithography, Raster graphics, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Superposition, Microfluidics, Scanners, Particles, Digital watermarking, Computer simulations, Printing, System identification, Immersion lithography, Semiconducting wafers

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Wafer-level optics, Polymers, Particles, Digital watermarking, Scanning electron microscopy, Printing, Immersion lithography, Neodymium, Semiconducting wafers, Defect inspection

SPIE Journal Paper | 1 January 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

Showing 5 of 18 publications
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