Chung-Hsing Chang
SPIE Involvement:
Publications (8)

Proceedings Article | 14 October 2011 Paper
Chun-Wei Wu, Chun-Cheng Liao, Chiang-Lin Shih, Chung-Hsing Chang, Stephen Hsu, Hua-Yu Liu, Zhipan Li
Proceedings Volume 8166, 81663C (2011)
KEYWORDS: Nanoimprint lithography, Diffractive optical elements, Source mask optimization, Critical dimension metrology, Photomasks, Optical proximity correction, Photovoltaics, Lithographic illumination, Image enhancement

Proceedings Article | 12 December 2009 Paper
Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh
Proceedings Volume 7520, 75201Q (2009)
KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

Proceedings Article | 16 March 2009 Paper
C. Y. Shih, R. C. Peng, T. C. Chien, Y. W. Guo, J. Y. Lee, C. L. Chang, P. C. Huang, H. H. Liu, H. J. Lee, John Lin, K. W. Chang, C. P. Yeh, W. J. Shao, H. Cao, A. Bruguier, X. Xie, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh
Proceedings Volume 7274, 72740T (2009)
KEYWORDS: Scanners, Semiconducting wafers, Data modeling, Calibration, Lithography, Manufacturing, Model-based design, Optical proximity correction, Wafer-level optics, Reticles

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002)
KEYWORDS: Photomasks, Resolution enhancement technologies, Etching, Wet etching, Optical lithography, Dry etching, Semiconducting wafers, Chromium, Reticles, Phase shifts

Proceedings Article | 1 August 2002 Paper
Chung-Hsing Chang, Chen-Hao Hsieh, San-De Tzu, Chang-Min Dai, Burn Lin, Linyong Pang, Qi-De Qian, Jiunn-Hung Chen, Jason Huang
Proceedings Volume 4754, (2002)
KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Scanning electron microscopy, Reticles, Phase shifts, Virtual reality, Printing, Phase shifting, Reflectivity

Showing 5 of 8 publications
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