Chung-Hsing Chang
at Brion Technologies
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photovoltaics, Lithographic illumination, Diffractive optical elements, Photomasks, Image enhancement, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Calibration, Scanners, Optimization (mathematics), Semiconducting wafers, Yield improvement, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Data modeling, Calibration, Scanners, Manufacturing, Optical proximity correction, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Etching, Dry etching, Chromium, Photomasks, Wet etching, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | August 1, 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Reticles, Phase shifting, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Virtual reality, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 11, 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Phase shifting, Calibration, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 8 publications
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