Mr. Chung-Hsing Chang
R&D Manager at Remarkable Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Manufacturing, Fourier transforms, Printing, Projection systems, Photomasks, Resolution enhancement technologies

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Scattering, Opacity, Etching, Inspection, Photomasks, Mask making, Phase measurement, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Manufacturing, Fourier transforms, Printing, Projection systems, Photomasks, Resolution enhancement technologies, Phase shifts

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