Chung-Shin Kang
Architect
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Process modeling, Resolution enhancement technologies

Proceedings Article | 10 July 2003 Paper
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Manufacturing, Photomasks, Optical proximity correction, Computer aided design, Integrated circuit design, Optics manufacturing, Resolution enhancement technologies, Phase shifts, Design for manufacturability

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