Chungwei Michael Hsu
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Diffractive optical elements, Scanners, Manufacturing, Finite element methods, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Metals, Manufacturing, Electroluminescence, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Data modeling, Calibration, Manufacturing, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Imaging systems, Calibration, Image processing, Design for manufacturing, Photomasks, Optical proximity correction, Statistical modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Reticles, Optical lithography, Detection and tracking algorithms, Scattering, Manufacturing, Printing, Photomasks, Algorithm development, Binary data, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Imaging systems, Etching, Quartz, Printing, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 36 publications
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