Mr. Chunlin Chen Profile

Chunlin Chen

at KLA Corp

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 11 May 2009 Paper

TeraScanXR: a high sensitivity and throughput photomask inspection system

Bo Mu, Aditya Dayal, Arosha Goonesekera, Phillip Lim, Chunlin Chen, Po Liu, Kevin Yeung, Becky Pinto, Bill Broadbent, Gregg Inderhees

Proceedings Volume 7379, 73792B (2009) https://doi.org/10.1117/12.824325

KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

Read Abstract +

Proceedings Article | 11 May 2009 Paper

Reticle inspection-based critical dimension uniformity

Venu Vellanki, Carl Hess, Gang Pan, Chunlin Chen, Gregg Inderhees, Daniel Lopez

Proceedings Volume 7379, 73791D (2009) https://doi.org/10.1117/12.824319

KEYWORDS: Reticles, Photomasks, Inspection, Critical dimension metrology, Scanning electron microscopy, Scanners, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Feedback control

Read Abstract +

Proceedings Article | 24 March 2009 Paper

Results from prototype die-to-database reticle inspection system

Bo Mu, Aditya Dayal, Bill Broadbent, Phillip Lim, Arosha Goonesekera, Chunlin Chen, Kevin Yeung, Becky Pinto

Proceedings Volume 7272, 72723O (2009) https://doi.org/10.1117/12.815574

KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Improving cost of ownership on KLA-Tencor wafer fab reticle inspections by implementing pixel migration via new STARlight2+ capability

Yung-Feng Cheng, Wei-Cyuan Lo, Ming-Jui Chen, Peter Huang, Chunlin Chen, Swapnajit Chakravarty, Paul Yu, Russell Dover

Proceedings Volume 7122, 71223J (2008) https://doi.org/10.1117/12.802331

KEYWORDS: Inspection, Photomasks, Reticles, Semiconducting wafers, Air contamination, Wafer inspection, Metals, Microelectronics, Data processing, Image processing

Read Abstract +

Proceedings Article | 16 November 2007 Paper

Improving inspectability with KLA-Tencor TeraScan thin line de-sense

Chunlin Chen, David Kim, Ki Hun Park, NamWook Kim, Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung

Proceedings Volume 6730, 67303O (2007) https://doi.org/10.1117/12.747180

KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

Read Abstract +

Proceedings Article | 30 October 2007 Paper

EUV mask process development using DUV inspection system

David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees

Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators

Read Abstract +

Proceedings Article | 25 October 2007 Paper

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung, Sang-Gyun Woo, Han Ku Cho, David Kim, Chunlin Chen, Ki-Hun Park, Gregg Inderhees

Proceedings Volume 6730, 673024 (2007) https://doi.org/10.1117/12.746567

KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

Read Abstract +

Proceedings Article | 15 May 2007 Paper

Evaluation of litho printability of DRAM contact hole patterns with various programmed defects

KangJoon Seo, SangIee Lee, HyunYoung Kim, DaeHo Hwang, Sangpyo Kim, Goomin Jeong, Oscar Han, Chunlin Chen, David Yee, EunJi Kim, KiHun Park, NamWook Kim, Sunny Choi, David Kim, Shrinkant Lohokare

Proceedings Volume 6607, 66072D (2007) https://doi.org/10.1117/12.728996

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Reticles, Tolerancing, Scanning electron microscopy, Lithography, Manufacturing, Printing, Critical dimension metrology

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years