Chunlin Chen
at KLA Corp
SPIE Involvement:
Publications (8)

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792B (2009)
KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

Proceedings Article | 11 May 2009 Paper
Venu Vellanki, Carl Hess, Gang Pan, Chunlin Chen, Gregg Inderhees, Daniel Lopez
Proceedings Volume 7379, 73791D (2009)
KEYWORDS: Reticles, Photomasks, Inspection, Critical dimension metrology, Scanning electron microscopy, Scanners, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Feedback control

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 72723O (2009)
KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223J (2008)
KEYWORDS: Inspection, Photomasks, Reticles, Semiconducting wafers, Air contamination, Wafer inspection, Metals, Microelectronics, Data processing, Image processing

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67303O (2007)
KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

Showing 5 of 8 publications
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