Chunlin Chen
at KLA Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Logic, Detection and tracking algorithms, Imaging systems, Sensors, Databases, Inspection, Photomasks, SRAF, Critical dimension metrology

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Critical dimension metrology, Feedback control, Semiconducting wafers

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Signal to noise ratio, Reticles, Logic, Detection and tracking algorithms, Imaging systems, Sensors, Inspection, SRAF, Prototyping, Digital breast tomosynthesis

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Air contamination, Metals, Image processing, Inspection, Data processing, Microelectronics, Wafer inspection, Photomasks, Semiconducting wafers

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electronics, Sensors, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 8 publications
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