Clair Webb
at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Design for manufacturing, Transistors, Optical proximity correction, Product engineering

Proceedings Article | 10 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Logic, Metals, Signal processing, Extreme ultraviolet, Transistors, Optical proximity correction, Computer aided design, 193nm lithography, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top