The difficult issues in continuing Moore's law with the lack of improvement in lithography resolution are well
known.<sup>1, 2, 3</sup> Design rules have to change and DFM methodology has to continue to improve to enable Moore's law
scaling. This paper will discuss our approach to DFM though co-optimization across design and process. The poly
layer is used to show how rules have changed to meet patterning requirements and how co-optimization has been used
to define the poly design rules.
With the introduction and ramp of several products on our 45nm technology, we have shown our ability to meet the
goals of Moore's law scaling at high yields in volume manufacturing on a two year cycle.
The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.