Dr. Claire van Lare
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 May 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Inspection, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

SPIE Journal Paper | 6 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, EUV optics, Phase shifts

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Semiconducting wafers, Phase shifts

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top