Claudio Masia
Regional Technology Support at Applied Materials Europe BV
SPIE Involvement:
Publications (4)

Proceedings Article | 16 April 2010 Paper
Liraz Gershtein, Ram Peltinov, Stefano Ventola, Claudio Masia, Chanjuan Xing
Proceedings Volume 7638, 76383D (2010)
KEYWORDS: Line edge roughness, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Metrology, Critical dimension metrology, Edge roughness, Lithography, Semiconducting wafers, Photomasks

Proceedings Article | 25 March 2008 Paper
Ilan Englard, Raf Stegen, Peter Vanoppen, Ingrid Minnaert-Janssen, Ted der Kinderen, Erik van Brederode, Frank Duray, Jeroen Linders, Denis Ovchinnikov, Rich Piech, Claudio Masia, Noam Hillel, Erez Ravid, Ofer Rotlevi, Amir Wilde, Saar Shabtay, Zach Telor, Robert Schreutelkamp
Proceedings Volume 6922, 69223U (2008)
KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Photodynamic therapy, Polarization, Particles, Immersion lithography, Scanners, Deep ultraviolet, Image classification

Proceedings Article | 24 March 2008 Paper
Ilan Englard, Richard Piech, Claudio Masia, Noam Hillel, Liraz Gershtein, Dana Sofer, Ram Peltinov, Ofer Adan
Proceedings Volume 6922, 69221D (2008)
KEYWORDS: Overlay metrology, Critical dimension metrology, Lithography, Metrology, Process control, Scanners, Optical lithography, Double patterning technology, Semiconducting wafers, Monochromatic aberrations

Proceedings Article | 5 April 2007 Paper
Ilan Englard, Peter Vanoppen, Jo Finders, Ingrid Minnaert-Janssen, Frank Duray, Jeroen Meessen, Gert-Jan Janssen, Ofer Adan, Liraz Gershtein, Ram Peltinov, Claudio Masia, Richard Piech
Proceedings Volume 6518, 65181G (2007)
KEYWORDS: Overlay metrology, Critical dimension metrology, Etching, Lithography, Monte Carlo methods, Scanning electron microscopy, Metrology, Semiconducting wafers, Reticles, Algorithm development

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