Dr. Clemens S. Utzny
Senior process engineer at Qoniac
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Etching, Manufacturing, Quality measurement, Scanning electron microscopy, Photomasks, Machine learning, Convolution, Critical dimension metrology, Environmental sensing

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers, Performance modeling

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Detection and tracking algorithms, Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Principal component analysis, Statistical analysis, Data modeling, Distance measurement, Photomasks, Machine learning, Critical dimension metrology, Statistical modeling, Performance modeling

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Internet, Statistical analysis, Manufacturing, Process control, Photomasks, Machine learning, Artificial intelligence, Critical dimension metrology, Evolutionary algorithms

Showing 5 of 18 publications
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