Clement T. Anyadiegwu
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: System on a chip, Polymers, Carbon, Etching, Silicon, Photomasks, Plasma etching, Semiconducting wafers, Resistance, Coating

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Etching, Metals, Semiconducting wafers, Photomasks, Silicon, Coating, Oxides, Extreme ultraviolet lithography, Lithography, Photoresist materials

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconducting wafers, Silicon, Coating, Inspection, Manufacturing, Chemistry, Fourier transforms, Defect inspection, Polymers, Photoresist materials

Proceedings Article | 9 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Etching, Dry etching, Resistance, Lithography, Photoresist materials, 193nm lithography, Line width roughness, Molecules, Polymerization

Proceedings Article | 6 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Line edge roughness, Nanoimprint lithography, Photomasks, Line width roughness, Fourier transforms, Binary data, Transmittance, Lithography, Polymers, Diffusion

Showing 5 of 11 publications
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