Clement T. Anyadiegwu
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Etching, Polymers, Silicon, Coating, Resistance, Photomasks, Plasma etching, Semiconducting wafers, System on a chip

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Oxides, Lithography, Etching, Metals, Silicon, Coating, Photoresist materials, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Silicon, Coating, Chemistry, Manufacturing, Inspection, Fourier transforms, Photoresist materials, Semiconducting wafers, Defect inspection

Proceedings Article | 9 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Molecules, Resistance, Photoresist materials, Polymerization, Line width roughness, 193nm lithography

Proceedings Article | 6 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Diffusion, Fourier transforms, Transmittance, Photomasks, Line width roughness, Nanoimprint lithography, Line edge roughness, Binary data

Showing 5 of 11 publications
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