Clyde H. Browning
Mask Design Manager at ASELTA Nanographics
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Electron beam lithography, Point spread functions, Electron beams, Scattering, Calibration, Scanning electron microscopy, Critical dimension metrology, Tolerancing

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Silicon, Manufacturing, Data processing, Photomasks, Optical proximity correction, Photoresist processing, Tolerancing

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Metrology, Logic, Optical lithography, Data modeling, Calibration, Manufacturing, Electroluminescence, Software development, Optical simulations, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Electronic design automation

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Photonic crystals, Printing, Data processing, Photomasks, Photoresist processing, Tolerancing, Vestigial sideband modulation

Showing 5 of 12 publications
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