Clyde H. Browning
Mask Design Manager at ASELTA Nanographics
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Author
Publications (12)

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Point spread functions, Scattering, Scanning electron microscopy, Tolerancing, Critical dimension metrology, Calibration, Electron beam lithography, Electron beams

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Tolerancing, Data processing, Lithography, Manufacturing, Photomasks, Data modeling, Optical proximity correction, Photoresist processing, Silicon

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Electron beam lithography, Lithography, Optical lithography, Photoresist processing, Software development, Semiconducting wafers, Optical simulations, Electronic design automation, Data modeling, Metrology, Point spread functions, Electroluminescence, Logic, Critical dimension metrology, Calibration, Manufacturing

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Point spread functions, Critical dimension metrology, Algorithm development, Scattering, Calibration, Cadmium sulfide, Computer simulations, Semiconducting wafers, Photovoltaics, Electron beams

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Tolerancing, Lithography, Manufacturing, Vestigial sideband modulation, Photomasks, Data processing, Photoresist processing, Electron beam lithography, Printing, Photonic crystals

Showing 5 of 12 publications
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