Mr. Cody M. Berger Profile

Cody M. Berger

Graduate Student at Georgia Inst of Technology

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Author

Publications (6)

Proceedings Article | 4 May 2005 Paper

Effect of film composition on the performance of interdigitated electrode methods used for chemically amplified photoresist characterization: methods for analyzing photoresist materials containing base quencher

Cody Berger, Clifford Henderson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607437

KEYWORDS: Capacitance, Polymers, Electrodes, Polymer thin films, Photoresist materials, Sensors, Molecules, Dielectrics, Chemical analysis, Data modeling

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Proceedings Article | 14 May 2004 Paper

Chemically amplified photoresist characterization using interdigitated electrodes: an improved method for determining the Dill C parameter

Cody Berger, Clifford Henderson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536243

KEYWORDS: Capacitance, Data modeling, Polymers, Electrodes, Photoresist materials, Polymer thin films, Dielectrics, Sensors, Coating, Silicon

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Proceedings Article | 14 May 2004 Paper

Improved chemically amplified photoresist characterization using interdigitated electrode sensors: photoacid diffusivity measurements

Cody Berger, Clifford Henderson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536218

KEYWORDS: Diffusion, Humidity, Resistance, Electrodes, Polymers, Photoresist materials, Sensors, Dielectric spectroscopy, Polymer thin films, Ions

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Proceedings Article | 14 May 2004 Paper

Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene

Trevor Hoskins, Cody Berger, Peter Ludovice, Clifford Henderson, Larry Seger, Chun Chang, Larry Rhodes

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536264

KEYWORDS: Polymers, Hydrogen, Solids, Photoresist materials, FT-IR spectroscopy, Ultraviolet radiation, Optical lithography, Lithography, Photoresist developing, Molecules

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Proceedings Article | 12 June 2003 Paper

Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Cody Berger, Clifford Henderson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485081

KEYWORDS: Capacitance, Electrodes, Polymers, Photoresist materials, Absorbance, Dielectrics, Sensors, Coating, Chemically amplified resists, Data modeling

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Proceedings Article | 12 June 2003 Paper

Equilibrium sorption and rate of diffusion of water into photoresist thin films

Cody Berger, Clifford Henderson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485079

KEYWORDS: Polymers, Humidity, Dielectrics, Diffusion, Capacitance, Crystals, Electrodes, Photoresist materials, Thin films, Quartz

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Showing 5 of 6 publications

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