Mr. Colbert Lu Profile

Colbert Lu

Mask Expert at TMC

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Author

Publications (10)

Proceedings Article | 26 September 2019 Paper

Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask

William Chou, Jeffrey Cheng, C. Twu, Adder Lee, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Edgar Huang, Junjin Lin, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Heng Jen Lee, Young Ham

Proceedings Volume 11148, 111481I (2019) https://doi.org/10.1117/12.2537938

KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Semiconducting wafers, 3D metrology, Immersion lithography, Etching, Lithography, Binary data

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Proceedings Article | 26 September 2019 Paper

Practical lithography hotspot identification using mask process model

Pai Chi Chen, Chain Ting Huang, Shang Feng Weng, Yung Feng Cheng, Young Ham, Colbert Lu, Michael Green, Mohamed Ramadan, Hong Jen Lee, Chris Progler

Proceedings Volume 11148, 111481H (2019) https://doi.org/10.1117/12.2537935

KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

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Proceedings Article | 3 October 2018 Paper

Hotspot analysis and empirical correction through mask and wafer technology harmonization

Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler

Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427

KEYWORDS: Optical proximity correction, Photomasks, Lithography

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Proceedings Article | 16 October 2017 Paper

Process window discovery from mask inspection for hotspot analysis and verification

James Cheng, William Chou, C. Twu, Hsin-Fu Chou, Jackie Cheng, Colbert Lu, Heng-Jen Lee, Bosheng Zhang, Mehdi Daneshpanah, Apo Sezginer, David Wu, Mike Yeh, Albert Chien

Proceedings Volume 10451, 104510X (2017) https://doi.org/10.1117/12.2281215

KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Lithography, 3D modeling, Near field, Photoresist materials, Semiconducting wafers

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Proceedings Article | 4 October 2016 Paper

The CD control improvement by using CDSEM 2D measurement of complex OPC patterns

William Chou, Jeffrey Cheng, Adder Lee, James Cheng, Alex Tzeng, Colbert Lu, Ray Yang, Hong Jen Lee, Hideaki Bandoh, Izumi Santo, Hao Zhang, Chien Kang Chen

Proceedings Volume 9985, 99851M (2016) https://doi.org/10.1117/12.2241326

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Holons, Lithography, Edge roughness, Source mask optimization

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Proceedings Article | 23 October 2015 Paper

In die mask overlay control for 14nm double-patterning lithography

William Chou, James Cheng, Alex Tseng, J. Wu, Chin Kuei Chang, Jeffrey Cheng, Adder Lee, Chain Ting Huang, N. Peng, Simon C. Hsu, Chun Chi Yu, Colbert Lu, Julia Yu, Peter Craig, Chuck Pollock, Young Ham, Jeff McMurran

Proceedings Volume 9635, 96351R (2015) https://doi.org/10.1117/12.2196794

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Image registration, Double patterning technology, Lithography, Source mask optimization, Reticles, Pellicles, 193nm lithography

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Proceedings Article | 20 October 2006 Paper

Utilize AIMS simulation to estimate profile side-wall angle

Colbert Lu, C. Lin, C. Wang

Proceedings Volume 6349, 634943 (2006) https://doi.org/10.1117/12.686469

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Etching, Chromium, Reticles, Lithography, Lutetium, Air contamination

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Proceedings Article | 6 December 2004 Paper

AIMS-fab SPEC for defect repair and better repair profile

Colbert Lu, William Chou, Andy Cheng, J. Wu

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.581066

KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Binary data, Critical dimension metrology, Atomic force microscopy, Etching, Manufacturing, Reticles, Quartz

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Proceedings Article | 20 August 2004 Paper

CD uniformity improvement by loading effect correction (LEC) function for 90-nm reticle

Colbert Lu, Torey Huang, Shone Lee

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.562776

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Reticles, Chromium, Data corrections, Modulation, Lutetium, Cadmium, Computed tomography

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Proceedings Article | 27 December 2002 Paper

Advanced CD linearity improvement for multiproject wafers and SoC at 95-nm technology node

Jeremy Lu, Nicole Sandlin, Hidetoshi Sato, Colbert Lu, Nicole Cheng, Torey Huang, Clyde Su, Melisa Buie

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467750

KEYWORDS: Photomasks, Etching, System on a chip, Semiconducting wafers, Critical dimension metrology, Photoresist materials, Diffractive optical elements, Chlorine, Photoresist processing, Scanning electron microscopy

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Showing 5 of 10 publications

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